Semiconductor device and method of manufacturing the same

ABSTRACT

Disclosed herein is a semiconductor device and method of manufacturing the same. A step between a memory cell formed in a cell region and a transistor formed in a peripheral circuit region is minimized, and the height of a gate in the memory cell is minimized. Accordingly, subsequent processes are facilitated and the electrical property of the device is thus improved.

BACKGROUND

1. Technical Field

A semiconductor device and method of manufacturing the same aredisclosed in which the size of steps between memory cells andtransistors can be reduced.

2. Description of the Related Art

In a manufacture process of a NAND flash memory device, a SAFG(Self-Aligned Floating Gate) method is employed. This SAFG method is atechnology where a tunnel oxide film and a polysilicon layer aresequentially formed on a semiconductor substrate portions of thepolysilicon layer and the tunnel oxide film disposed in an elementisolation region are then removed. The semiconductor substrate is thenetched in a word line direction to form a trenches in the elementisolation region. The trenches are then buried or filled with aninsulating material to form an element isolation film while patterningthe polysilicon layer.

A manufacturing method using the SAFG method can have the followingproblems.

First, the SAFG method is advantageous in the word line direction, butis disadvantageous in that it is difficult to shrink the device in a bitline direction because an existing RIE mode is used. That is, in theprocess of etching the stack structure having a high step at the sametime, which consists of Poly1/ONO/Poly2/WSi/Nitride/Oxynitride, etc.,there is a difficulty in etching them using the existing technology ifthe design rule is small.

Second, in order to form transistors in the peripheral region, after theself-aligned floating gate and the tunnel oxide film are removed, anoxidization process for forming the gate oxide film must be repeated.

Third, the process of forming a polysilicon layer for a control gate,etching the polysilicon layer for a control gate by an etch processusing a hard mask and then forming an underlying polysilicon layer for afloating gate by means of a self-aligned etch mode is advantageous inthat the floating gate is aligned. This process, however, isdisadvantageous in that residues are generated because of by-productssince several layers are etched at the same time and there is a limit toselection of chemicals for the post cleaning.

Fourth, if the polysilicon layer for the floating gate is etched by anexisting reactive ion etch (RIE) method, it is difficult to set a targetetch thickness or an etch end time as an etch thickness increases due toa high or large step. Therefore, etch damage can be generated in thesemiconductor substrate. It is also difficult to bury or fillbetween—the gate lines with the insulating material since the gapbetween the gate lines is relatively deep.

Fifth, if the self-aligned etch process is performed in the RIE mode,etch technologies having a high selective ratio between oxide andnitride are required in order to protect the gate lines using a spacernitride film and to form a metal contact (SAC process).

Sixth, if the SAC process is employed, there is a difficulty in loweringresistance to a target value since the area at the bottom of the metalcontact reduces because of the spacer nitride film.

Seventh, a relatively thick interlayer insulating film is formed in theperipheral circuit region due to the structure of the memory cell andthe transistor formed in the peripheral region and a difference inheight between them. In the process of forming the contact hole,therefore, the interlayer insulating film remains in the peripheralcircuit region. Accordingly, there is a problem in that the contact holeis not formed.

SUMMARY OF THE INVENTION

Accordingly, in view of the above problems, semiconductor device andmethod of manufacturing the same are disclosed in which a metal materialof good electrical property and stress property is used as a barriermetal layer, a step between a memory cell formed in a cell region and atransistor formed in a peripheral circuit region is minimized, and thegate height in the memory cell is minimized, whereby a subsequentprocess is facilitated, the gate is formed high and the electricalproperty of the device is thus improved.

One disclosed semiconductor device comprises: an interlayer insulatingfilm formed on the entire surface and having a damascene pattern formedin, a metal layer formed therein the damascene pattern, and a barriermetal layer formed between the metal layer and the interlayer insulatingfilm, wherein the barrier metal layer is composed of WN or TiSiN.

In the above, the content ratio of nitrogen in TiSiN preferably rangesfrom 25% to 35%.

Another disclosed semiconductor device comprises: an element isolationfilm which is formed in an element isolation region of a semiconductorsubstrate, wherein a top portion of the element isolation film includesprotrusions that extend above the semiconductor substrate, a gateinsulating film formed on the semiconductor substrate between theprotrusions of the element isolation films, a first polysilicon layerhaving a cylinder structure, which is formed on the gate insulating filmbetween the protrusions of the element isolation film, a secondpolysilicon layer formed on an inner wall of the first polysilicon layerof the cylinder structure, wherein the second polysilicon layer isformed on a concave portion of the floating gate, a metal layer formedwithin the second polysilicon layer, and source/drain formed on thesemiconductor substrate at the edge of the first polysilicon layers.

The semiconductor device can further comprise a dielectric film formedbetween the first polysilicon layer and the second polysilicon layer. Inthis time, the dielectric film can be formed on the entire outer wall ofthe second polysilicon layer.

A disclosed method of manufacturing a semiconductor device comprises:forming an element isolation film whose top is projected using aninsulating material in an element isolation region of a semiconductorsubstrate, forming an insulating film pattern where a floating gateregion is defined in an opening shape on an active region, forming astack structure of a gate insulating film and a first polysilicon layer,which are isolated by the insulating film pattern and the protrusion ofthe element isolation film, on the semiconductor substrate of thefloating gate region, forming a sacrificial insulating film in which aword line region is defined, on the entire surface including the firstpolysilicon layer, sequentially forming a dielectric film, a secondpolysilicon layer and a metal layer on the entire surface including thesacrificial insulating film, allowing the dielectric film, the secondpolysilicon layer and the metal layer to remain only in a space betweenthe sacrificial insulating films, removing the sacrificial insulatingfilms and the insulating film pattern, and forming source/drain on thesemiconductor substrate at the edge of the first polysilicon layer.

The forming of the element isolation film and the insulating filmpattern comprises: forming a pad oxide film and a pad nitride film onthe semiconductor substrate, etching the pad nitride film and the padoxide film of the element isolation region in a bit line direction,forming trenches in the semiconductor substrate of the element isolationregion, etching the pad nitride film and the pad oxide film in a wordline direction so that the pad nitride film remains only in a regionwhere a floating gate will be formed, burying a space between the padnitride films and the trenches with an insulating material, thus formingthe element isolation film and the insulating film pattern, and removingthe pad nitride film and the pad oxide film to expose the region wherethe floating gate will be formed.

In an embodiment the method can further comprise, after the trenches areformed, performing an oxidization process in order to mitigate etchdamage generated on the sidewalls and at the bottom of the trenches.

In an embodiment, the method can further comprise, after the pad nitridefilm and the pad oxide film are removed, etching the element isolationfilm and the insulating film pattern at the portions, which areprojected upwardly from the semiconductor substrate, in order to widenthe region where the floating gate will be formed. In this time, theprojected portion of the element isolation film and the insulating filmpattern can be etched by a wet etch process.

In an embodiment, the method can further comprise, before thesacrificial insulating film is formed, forming an etch-stop film on theentire surface including the first polysilicon layer. In this case, theetch-stop film is etched in the same pattern as the sacrificialinsulating film.

In an embodiment, the method can further comprise, before the dielectricfilm is formed, etching the first polysilicon layer by means of an etchprocess using the sacrificial insulating film as an etch mask, thusforming the first polysilicon layer in a cylinder structure.

The metal layer can be formed using tungsten. Meanwhile, the method canfurther comprise forming a barrier metal layer on the entire surfaceincluding the second polysilicon layer, before the metal layer isformed. The barrier metal layer can be formed using WN or TiSiN. In thistime, the content of Nitrogen in the TiSiN preferably ranges from 25% to35%. Furthermore, it is preferred that the barrier metal layer and themetal layer are consecutively formed in the same chamber.

Another disclosed method of manufacturing a semiconductor devicecomprises: forming an element isolation film whose top is projectedusing an insulating material in an element isolation region of asemiconductor substrate, and at the same time, forming an insulatingfilm pattern where a floating gate region is defined in an opening shapein a cell region and a gate region is defined in an opening shape in aperipheral circuit region; forming a stack structure of a gateinsulating film and a first polysilicon layer, which are isolated by theinsulating film pattern and the protrusion of the element isolationfilm, on the semiconductor substrate of the floating gate region and thegate region; forming a sacrificial insulating film where a word lineregion and the gate region are defined, on the entire surface includingthe first polysilicon layer, forming a dielectric film on the cellregion including the sacrificial insulating film; sequentially forming asecond polysilicon layer and a metal layer on the entire surfaceincluding the sacrificial insulating film; allowing the dielectric film,the second polysilicon layer and the metal layer to remain only in aspace between the sacrificial insulating films; removing the sacrificialinsulating films and the insulating film pattern; and formingsource/drain on the semiconductor substrate at the edge of the firstpolysilicon layer.

In an embodiment, the forming of the element isolation film and theinsulating film pattern comprises: forming a pad oxide film and a padnitride film on the semiconductor substrate, etching the pad nitridefilm and the pad oxide film of the element isolation region, formingtrenches in the semiconductor substrate of the element isolation region,removing the pad nitride film in the floating gate region of the cellregion and the gate region of the peripheral region, burying a spacebetween the pad nitride films and the trenches with an insulatingmaterial, thus forming the element isolation film and the insulatingfilm pattern, and removing the pad nitride film and the pad oxide filmto expose the floating gate region and the gate region.

Meanwhile, the gate insulating film in the cell region and theperipheral circuit region have different thicknesses.

In an embodiment, the method can further comprise, after the trenchesare formed, performing an oxidization process in order to mitigate etchdamage generated on the sidewalls and at the bottom of the trenches.

In an embodiment, the method can further comprise, after the pad nitridefilm and the pad oxide film are removed, etching the projected portionof the element isolation film and the insulating film pattern in orderto widen the region where the floating gate will be formed. At thistime, the projected portion of the element isolation film and theinsulating film pattern can be etched by a wet etch process.

In an embodiment, the method can further comprise, before thesacrificial insulating film is formed, forming an etch-stop film on theentire surface including the first polysilicon layer. In this case, theetch-stop film is etched in the same pattern as the sacrificialinsulating film.

In an embodiment, the method can further comprise the step of, beforethe dielectric film is formed, etching the first polysilicon layer bymeans of an etch process using the sacrificial insulating film as anetch mask, thus forming the first polysilicon layer in a cylinderstructure.

In an embodiment, the metal layer can be formed using tungsten.Meanwhile, the method can further comprise the step of forming a barriermetal layer on the entire surface including the second polysiliconlayer, before the metal layer is formed. The barrier metal layer can beformed using WN or TiSiN. In this time, the content of Nitrogen in theTiSiN preferably ranges from 25% to 35%. Furthermore, it is preferredthat the barrier metal layer and the metal layer be consecutively formedin the same chamber.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a sectional view for explaining a barrier metal layer of adisclosed semiconductor device;

FIGS. 2A and 2B are characteristic graphs showing electrical propertiesof TiSiN;

FIG. 3 is a layout diagram showing a flash memory cell region adisclosed semiconductor device; and

FIGS. 4 to 21 are sectional views explaining a disclosed method ofmanufacturing a flash memory device.

DETAILED DESCRIPTION OF THE PRESENTLY PREFERRED EMBODIMENTS

Now, the preferred embodiments will be described with reference to theaccompanying drawings. Since preferred embodiments are provided for thepurpose of explanation to those of ordinary skill in the art, they maybe modified in various manners and the scope of this disclosure is notlimited by the specific preferred embodiments described herein. Further,in the drawings, the thickness and size of each layer are exaggeratedfor convenience and clarity. Like reference numerals are used toidentify the same or similar parts. Meanwhile, in case where it isstated that one film is “on” the other film or a semiconductorsubstrate, the one film may directly contact the other film or thesemiconductor substrate. Or, one or more additional films may bedisposed between the one film and the other film or the semiconductorsubstrate.

FIG. 1 is a sectional view illustrating a barrier metal layer of adisclosed semiconductor device.

Referring to FIG. 1, an interlayer insulating film 104 is formed on asemiconductor substrate 101 in which a lower conductive layer 103 isformed. A damascene pattern 104 a which includes a trenches or a viahole is formed in the interlayer insulating film 104. The lowerconductive layer 103 can be formed using polysilicon or a common metalmaterial. Reference numeral 102 indicates a lower interlayer insulatingfilm.

A metal layer 106 is formed in the damascene pattern 104 a in order toconnect the lower conductive layer 103 to peripheral elements (notshown). In this time, the metal layer 106 is typically formed usingtungsten, but can be formed using copper or aluminum.

Meanwhile, in order to prevent the electrical property from beinglowered because of the metal component of the metal layer 106 beingdiffused into the interlayer insulating film 104, a barrier metal layer105 is formed between the metal layer 106 and the interlayer insulatingfilm 104.

Generally, the barrier metal layer 105 has a stack structure of Ti/TiN.In the present invention, the barrier metal layer 105 is formed using WNor TiSiN. Of them, TiSiN is a material having a better electricalproperty and stress property than the stack structure of Ti/TiN. It ispossible to control specific resistance and stress property of the TiSiNfilm by controlling the Nitrogen content.

FIGS. 2A and 2B are characteristic graphs showing electrical propertiesof TiSiN.

From FIG. 2A, it can be seen the lower the content ratio of nitrogen inthe TiSiN film, the lower the specific resistance.

Meanwhile, from FIG. 2B, it can be seen that stress is the lowest whenthe content ratio of nitrogen in the TiSiN film is about 30% and thestress property is abruptly degraded around 30%.

It is preferred that if a specific resistance characteristic ispreferentially considered depending on the property, the content ratioof nitrogen is minimized, and if the stress property is preferentiallyconsidered, the content ratio of nitrogen is set to about 30%. If thespecific resistance characteristic and the stress property areconsidered at the same time, the nitrogen content preferably ranges from25% to 35%.

Even when the barrier metal layer 105 is formed using WN, it ispreferred that the content ratio of nitrogen is set in consideration ofthe electrical characteristic and stress property.

As such, according to the present invention, by forming the barriermetal layer 105 using WN or TiSiN, a better electrical characteristiccan be obtained than the conventional barrier metal layer composed ofthe stack structure of Ti/TiN.

A method of manufacturing the flash memory device employing theaforementioned barrier metal layer will now be described.

FIG. 3 is a layout diagram showing the flash memory cell region in thesemiconductor device according to the present invention. FIGS. 4 to 21are sectional views for explaining a method of manufacturing a flashmemory device according to an embodiment of the present invention.

Referring to FIG. 4, a pad oxide film 202 and a pad nitride film 203 aresequentially formed on a semiconductor substrate 201. At this time, athickness of the pad nitride film 203 can be decided in such a mannerthat an element isolation film to be formed in a subsequent process isprojected higher than the semiconductor substrate 201. Therefore, thethickness of the pad nitride film 203 is preferably decided consideringthe above fact. For example, the pad nitride film 203 can be formed witha thickness ranging from 500 Å to 1500 Å.

Referring to FIG. 5, the pad nitride film 203 and the pad oxide film 202are patterned to expose the semiconductor substrate 201 in the elementisolation region where the element isolation film will be formed. Atthis time, in the cell region, the pad nitride film 203 is patterned ina bit line direction. After the pad nitride film 203 is patterned, theexposed semiconductor substrate 201 is etched to form trenches 204.Thereby, the trenches 204 are formed in the cell region and the elementisolation region of the peripheral region.

Next, the pad nitride film 203 is patterned again. That is, as shown inFIG. 6, in the cell region, the pad nitride film 203 is secondarilyetched so that the pad nitride film 203 is patterned in a word linedirection. In this time, in the peripheral circuit region, the padnitride film 203 is etched so that the gate region of the transistor hasan opening shape. In this time, the pad oxide film 202 can be alsoetched. Thereby, the pad nitride film 203 of the cell region ispatterned both in the word line direction A-A′ and the bit linedirection B-B′. In the cell region, as the pad nitride film 203 isetched in the word line direction once, the semiconductor substrate 201is partially exposed.

In the above, what the pad nitride film 203 of the cell region ispatterned in the word line direction A-A′ once again is for defining aregion where a polysilicon layer for a floating gate will be formed inthe cell region. That is, in the cell region, a region where the padnitride film 203 remains becomes a region where the floating gate of theflash memory will be formed. Meanwhile, in the peripheral region, aregion where the pad nitride film 203 remains become a region where thepolysilicon layer for the gate electrode of the transistor will beformed.

Referring to FIG. 7, in order to compensate for etch damage generated inthe etch process for forming the trenches 204, the sidewalls of thetrenches 204 are oxidized to form a liner oxide film 205. As a damagedlayer generated on the sidewalls and at the bottom of the trenches 204is formed by the liner oxide film 205, the damaged layer is removed andthe liner oxide film 205 becomes some of the element isolation film.

Referring to FIG. 8, the trenches 204 are buried with an insulatingmaterial to form an element isolation film 206. The element isolationfilm 206 can be formed by burying the trenches 204 using high-densityplasma (HDP) oxide. In this time, the insulating material deposited onthe pad nitride film 203 can be removed by chemical mechanical polishing(CMP), wherein HSS (High Selective Slurry) can be used as a polisher.

Meanwhile, in the cell region, the trenches 204 are filled with theinsulating material 206 with the pad nitride film 203 being patterned inthe bit line direction B-B′, as shown in FIG. 9. Thus, even spacesbetween the pad nitride films 203 are filled with the insulatingmaterial 206 for the element isolation film in the bit line directionB-B′. As such, the insulating material 206 for the element isolationfilm, which is buried into the spaces between the pad nitride films 203,becomes an insulating film pattern for defining the region where thefloating gate will be formed in a subsequent process.

Referring to FIG. 10, the pad nitride film (203 in FIGS. 8 and 9) isremoved. As the pad nitride film (203 in FIGS. 8 and 9) is removed, theelement isolation film 206 remains so that protrusions 206 a of theinsulation layer 206 project above the semiconductor substrate 201.Furthermore, in the cell region, the insulating material layer (206 inFIG. 9) remains on the semiconductor substrate 201 in the bit linedirection. The insulation material 206 in the cell region is in the formof an open shape pattern in which the floating gate region is disposed.

The same is true of even in the peripheral circuit region. That is,although not shown in the drawings, the insulating material layerremains even on the active region of the peripheral region, and remainsin the form of an open shape pattern in which the gate region of thetransistor is disposed.

Referring to FIG. 11, the protrusions 206 a of the element isolationfilm 206, which are projected higher than the semiconductor substrate201, are etched to a given thickness or width. The protrusions 206 a ofthe element isolation film 206 can be etched by a wet etch process. Inthe wet etch process, a fluorine-based solution can be used as anetchant.

Thereby, the width of the protrusions 206 a of the element isolationfilm 206 is narrowed and the height is reduced. At this time, as shownin FIG. 12, the width of the insulating material 206, which remains inthe bit line direction B-B′ in the cell region, is narrowed and theheight thereof is reduced. If the width of the protrusions 206 a of theelement isolation film 206 is narrowed and the distance betweenneighboring protrusions 206 a is increased, the area in which thepolysilicon layer for the floating gate will be formed also increases.

Meanwhile, in the procedure of etching the protrusions 206 a of theelement isolation film 206, the pad oxide film (202 in FIG. 11)remaining on the semiconductor substrate 201 is also removed.

Referring to FIG. 13, gate insulating films 207 and first polysiliconlayers 208 are sequentially formed on the semiconductor substrate 201between the protrusions 206 a. This will be described in more detail.The gate insulating films 207 are formed on the semiconductor substrate201 between the protrusions 206 a. After a polysilicon layer is formedon the entire surface to bury the spaces between the protrusions 206 a,the polysilicon layer on the pad nitride film 203 is stripped by CMP, sothat the first polysilicon layer 208 remain only in the spaces betweenthe protrusions 206 a.

At this time, the gate insulating film 207 formed in the cell regionbecomes a tunnel oxide film of the flash memory cell, and the gateinsulating film 207 formed in the peripheral regions become a gate oxidefilm of the transistor. As the tunnel oxide film and the gate oxide filmare quite different in thickness, there are preferably formed by adifferent process. As such, the method of forming the tunnel oxide filmand the gate oxide film by a different process is well known in the art.

Meanwhile, as shown in FIG. 14, the first polysilicon layers 208 of thecell region are isolated both in the bit line direction B-B′ and theword line direction by means of the protrusions 206 a of the elementisolation film 206 and the insulating material 206 remaining on thesemiconductor substrate 201. Accordingly, the first polysilicon layers208 can be used as the floating gate even without further patterningprocess.

Furthermore, the edges of the first polysilicon layers 208 are formed insuperposition on the element isolation film 206, and are formed in anarrow space even in the bit line direction B-B′. It is thus possible tomaximize the area of the first polysilicon layer 208.

Through the above method, while the element isolation film 206 is formedin the element isolation region, the first polysilicon layer 208, whichis isolated both in the word line direction A-A′ and the bit linedirection B-B′, can be formed on the semiconductor substrate 201. Thismethod is called a self-aligned floating gate (SAFG) process.

At this time, the first polysilicon layer 208 formed in the cell regionis for forming the floating gate of the flash memory cell, and the firstpolysilicon layers 208 formed in the peripheral region is for formingthe gate of the transistor.

Referring to FIG. 15, an etch-stop film 209 and a sacrificial insulatingfilms 210 are sequentially formed on the entire surface including thefirst polysilicon layer 208. At this time, the sacrificial insulatingfilm 210, for defining a region where a second polysilicon layer to beformed in a subsequent process, will be formed. Furthermore, a thicknessof the second polysilicon layer to be formed in a subsequent process isdecided according to a thickness of the sacrificial insulating film 210.It is thus preferred that the thickness of the sacrificial insulatingfilm 210 be set considering the above fact.

Meanwhile, the etch-stop film 209 serves to prevent underlying elements(for example, polysilicon layer) from being etched in a subsequent etchprocess. However, if the etch selective ratio against the underlyingelements when the sacrificial insulating film 210 is etched iscontrolled, the etch-stop film 209 can be omitted.

Hereinafter, in order to facilitate understating, description will bemade with reference to the sectional view taken along line B-B′ in thebit line direction in the layout diagram of FIG. 3 will be described.Therefore, the element isolation film is not shown in the subsequentdrawings.

Referring to FIG. 16, the sacrificial insulating film 210 is patternedby an etch process using the gate mask. In this time, if the etch-stopfilm 209 is formed, the etch-stop film 209 is used as the etch-stoplayer. After the sacrificial insulating film 210 is etched, theetch-stop film 209 is additionally etched. Thereby, in the cell region,the region from which the sacrificial insulating films 210 is etchedbecomes a region where the control gate will be formed.

Referring to FIG. 17, the exposed portions of the first polysiliconlayer 208 in the cell region are etched by a given thickness by means ofan etch process using the sacrificial insulating films 210 as an etchmask. Thus, the first polysilicon layer 208 of the cell region is formedto have a μ shape as shown in the left of FIG. 17. As the surface areaincreases, the coupling ratio of the flash memory cell can be increased.

This process can be performed only in the cell region and can beperformed even in the peripheral circuit region at the same time.

Referring to FIG. 18, a dielectric film 211 is formed in the cellregion. In this time, if the dielectric film 211 is formed even in theperipheral region, a polysilicon layer to be formed in a subsequentprocess and the first polysilicon layers 208 are electrically isolated.The same structure as the flash memory cell is formed. Accordingly, thedielectric film 211 is formed only in the cell region so that thepolysilicon layer to be formed in the subsequent process and the firstpolysilicon layers 208 are electrically connected in the peripheralregion.

This dielectric film 211 is then formed to have an ONO(Oxide-Nitride-Oxide) structure.

Referring to FIG. 19, a second polysilicon layer 212 for a control gateis formed on the entire surface of the cell region and the peripheralregion. A metal layer 214 is formed on the second polysilicon layer 212.

The second polysilicon layer 212 is preferably formed with a thicknessof the degree that it can be formed with a concave cross-section, whilemaintaining the step by the sacrificial insulating films 210 withoutcompletely burying the space between the sacrificial insulating films210. For example, the second polysilicon layer 212 can be formed with athickness ranging from 300 to 1000 Å.

Meanwhile, since the second polysilicon layer 212 is formed on the firstpolysilicon layer 208 with a concave shape in the cell region, the firstpolysilicon layers 208 and the second polysilicon layer 212 overlap evenin the sidewall of the first polysilicon layers 208. Thus, the entirecoupling ratio of the flash memory cell can be increased. Furthermore,in the peripheral circuit region, since the second polysilicon layer 212is formed with the dielectric film 211 not being formed, the secondpolysilicon layer 212 and the first polysilicon layers 208 are directlybrought into contact. Accordingly, the first polysilicon layers 208 andthe second polysilicon layer 212 become the gates of the transistors.

Meanwhile, the metal layer 214 is preferably formed using tungsten. Inthis case, a barrier layer 213 is preferably formed between the metallayer 214 and the second polysilicon layer 212. The barrier layer 213 ispreferably formed using WN or TiSiN.

If the barrier layer 213 is formed using WN, it can be formed in such amanner that while WN is deposited by supplying a nitrogen-containing gas(for example, NH₃ or N₂) upon deposition of tungsten, the supply of thenitrogen-containing gas is stopped and a tungsten layer is formed. Atthis time, the supply time of the nitrogen-containing gas is controlledso that WN is deposited to a thickness ranging from about 10 to about 50Å. Furthermore, tungsten is preferably formed to a thickness by whichthe spaces between the sacrificial insulating films 210 are completelyburied, preferably to a thickness ranging from 500 to 2000 Å.

If the barrier layer 213 is formed using TiSiN, after TiSiN is firstdeposited while replacing only a supply gas in the deposition apparatus,the metal layer 214 can be directly formed in-situ without vacuumbreakage or time delay. If the barrier layer 213 is formed using TiSiN,it can be formed to a thickness ranging from 20 to 200 Å. As describedwith reference to FIGS. 2A and 2B, specific resistance or the stressproperty is controlled by controlling the content ratio of N2.

Referring to FIG. 20, the metal layer 214, the barrier layer 213 and thesecond polysilicon layer 212 on the sacrificial insulating films 210 areremoved so that the second polysilicon layer 212, the barrier layer 213and the metal layer 214 remain only in the spaces between thesacrificial insulating films 210. This process can be performed in sucha manner the metal layer 214, the barrier layer 213 and the secondpolysilicon layer 212 are polished by CMP until the surface of theinsulating film contained in the dielectric film 211 of the cell regionor the sacrificial insulating films 210 of the peripheral region isexposed.

At this time, the polishing process can be performed in such a way thatthe second polysilicon layer 212 is used as a first etch-stop film whenthe metal layer 214 and the barrier layer 213 are polished, the metallayer 214 and the barrier layer 213 are polished and excessive polishingis then performed to polish up to the second polysilicon layer 212.Meanwhile, when the second polysilicon layer 212 is polished, it ispreferred that the polishing selective ratio is secure by maximum sothat polishing loss (dishing or erosion) is prevented from occurring inthe metal layer 214.

Thereby, in the cell region, the metal layer 214, the barrier layer 213and the second polysilicon layer 212 are isolated in a predeterminedpattern by the sacrificial insulating films 210. They become the controlgates of the flash memory cells. Also, in the peripheral region, themetal layer 214, the barrier layer 213, the second polysilicon layer 212and the first polysilicon layers 208 become the gate electrodes of thetransistors.

Referring to FIG. 21, materials remaining on the semiconductor substrate201 between the first polysilicon layers 208 are all removed. Animpurity is then injected into the active region of the exposedsemiconductor substrate 201, thus forming source/drain 215. At thistime, even in the peripheral region, an impurity is injected into thesemiconductor substrate 201, which is exposed as the insulating materialis removed, thus forming source/drain of the transistor. Thereby, theflash memory cells are formed in the cell region and the transistors areformed in the peripheral circuit region.

It was found that a step is rarely generated in the flash memory celland the transistor, which are completed, except that the step isgenerated about in a thickness of the dielectric film 211. If up to thedielectric film 211 on the sacrificial insulating films 210 is removed,the steps of the flash memory cell and the transistor can be made same.

Furthermore, since the control gate is formed in the concave portion ofthe first polysilicon layers 208, the entire height of the flash memorycell can be reduced. As the metal layer 214 is also formed in theconcave portion of the second polysilicon layer 212, the entire heightcan be further reduced. This allows a subsequent process to be performedmore easily.

Also, not only the patterning process for forming the control gate isperformed in the polishing process not the etch process, but also thefirst polysilicon layers 208 is previously patterned. Thus, the metallayer 214 and the second polysilicon layer 212 only can be polished.Accordingly, etch load of the patterning process can be reduced andgeneration of residues by etch by-products can be prohibited.

Meanwhile, after an interlayer insulating film is formed on the entiresurface by a subsequent process, a contact hole is formed, and thecontact hole is buried with a conductive material to form a contactplug. This process is carried out with the sidewall of the secondpolysilicon layer 212 being surrounded by the dielectric film 211.Therefore, it can prevent etch damage from being generated on thesidewall of the second polysilicon layer 212 or the second polysiliconlayer 212 and the contact plug from being brought into contact. That is,the dielectric film 211 serves as even an insulating film spacer of thesecond polysilicon layer 212.

As described above, a metal material having good electrical and stressproperties is used as a barrier metal layer, a step between a memorycell formed in a cell region and a transistor formed in a peripheralcircuit region is minimized, and the height of the memory cell isminimized. Therefore, when a subsequent process is facilitated, problemscaused by that a gate is formed high are solved, and the electricalproperty of the device can be improved.

Although the foregoing description has been made with reference to thepreferred embodiments, it is to be understood that changes andmodifications may be made by the ordinary skilled in the art withoutdeparting from the spirit and scope of this disclosure and the appendedclaims.

1. A semiconductor device comprising: an interlayer insulating filmformed having a damascene pattern formed therein; a metal layer formedin the damascene pattern; and a barrier metal layer formed between themetal layer and the interlayer insulating film, wherein the barriermetal layer comprises one of WN or TiSiN.
 2. The semiconductor device asclaimed in claim 1, wherein the barrier metal layer is TiSiN and thecontent of nitrogen in the TiSiN ranges from 25% to 35%.
 3. Asemiconductor device comprising: an element isolation film which isformed in an element isolation region of a semiconductor substrate, theelement isolation film comprising protrusions that project above thesemiconductor substrate; a gate insulating film formed on thesemiconductor substrate between the protrusions of the element isolationfilm; a first polysilicon layer of a cylindrical structure, which isformed on the gate insulating films between the protrusions of theelement isolation films to form a floating gate; a second polysiliconlayer formed on an inner wall of the first polysilicon layer, whereinthe second polysilicon layer is formed on a concave portion of the firstpolysilicon layer; a metal layer formed within the second polysiliconlayer; and a source/drain formed on the semiconductor substrate at anedge of the first polysilicon layer.
 4. The semiconductor device asclaimed in claim 3, further comprising a dielectric film formed betweenthe first polysilicon layer and the second polysilicon layer.
 5. Thesemiconductor device as claimed in claim 4, wherein the dielectric filmis formed on the entire outer wall of the second polysilicon layer.
 6. Amethod of manufacturing a semiconductor device comprising: (a) formingan element isolation film with an insulating material in an elementisolation region of a semiconductor substrate, the element isolationfilm comprising protrusions that project above the substrate, andforming an open insulating film pattern for accommodating a floatinggate on an active region; (b) forming a stack structure of a gateinsulating film and a first polysilicon layer, on the semiconductorsubstrate of the floating gate region, which are isolated by theinsulating film pattern and the protrusion of the element isolationfilm; (c) forming a sacrificial insulating film on the entire surfaceincluding the first polysilicon layer in which a word line region isdefined; (d) sequentially forming a dielectric film, a secondpolysilicon layer and a metal layer on the resulting structure includingthe sacrificial insulating film; (e) allowing the dielectric film, thesecond polysilicon layer and the metal layer to remain only in a spacebetween the sacrificial insulating films; (f) removing the sacrificialinsulating films and the insulating film pattern; and (g) formingsource/drain on the semiconductor substrate at the edge of the firstpolysilicon layer.
 7. The method as claimed in claim 6, wherein part (a)of the forming of the element isolation film and the insulating filmpattern comprises: (a-1) forming a pad oxide film and a pad nitride filmon the semiconductor substrate; (a-2) etching the pad nitride film andthe pad oxide film of the element isolation region in a bit linedirection; (a-3) forming trenches in the semiconductor substrate of theelement isolation region; (a-4) etching the pad nitride film and the padoxide film in a word line direction so that the pad nitride film remainsonly in a region where a floating gate will be formed; (a-5) filling aspace between the pad nitride films and the trenches with an insulatingmaterial, thus forming the element isolation film and the insulatingfilm pattern; and (a-6) removing the pad nitride film and the pad oxidefilm to expose the region where the floating gate will be formed.
 8. Themethod as claimed in claim 7, further comprising, after the trenches areformed, performing an oxidization process in order to mitigate etchdamage generated on the sidewalls and at the bottom of the trenches. 9.The method as claimed in claim 7, further comprising, after the padnitride film and the pad oxide film are removed, etching the protrusionsof the element isolation film and the insulating film pattern in orderto widen a region where the floating gate will be formed.
 10. The methodas claimed in claim 9, wherein the protrusions of the element isolationfilm and the insulating film pattern are etched by a wet etch process.11. The method as claimed in claim 6, further comprising, before thesacrificial insulating film is formed, forming an etch-stop film on theentire surface including the first polysilicon layer, wherein theetch-stop film is etched in the same pattern as the sacrificialinsulating film.
 12. The method as claimed in claim 6, furthercomprising, before the dielectric film is formed, etching the firstpolysilicon layer by means of an etch process using the sacrificialinsulating film as an etch mask, thus forming the first polysiliconlayer in a cylinder structure.
 13. The method as claimed in claim 6,wherein the metal layer comprises tungsten.
 14. The method as claimed inclaim 6, further comprising, forming a barrier metal layer on the entiresurface including the second polysilicon layer, before the metal layeris formed.
 15. The method as claimed in claim 14, wherein the barriermetal layer comprises WN or TiSiN.
 16. The method as claimed in claim15, wherein the barrier metal layer TiSiN and the content is Nitrogen inthe TiSiN ranges from 25% to 35%.
 17. The method as claimed in claim 14,wherein the barrier metal layer and the metal layer are consecutivelyformed in the same chamber.
 18. A method of manufacturing asemiconductor device comprising: (a) forming an element isolation filmwith a top surface having upwardly directed protrusions using aninsulating material in an element isolation region of a semiconductorsubstrate, and at the same time, forming an insulating film pattern fromsaid protrusions where a floating gate region is defined by said patternin a cell region and a gate region is defined in a said pattern in aperipheral circuit region; (b) forming a stack structure of a gateinsulating film and a first polysilicon layer, which are isolated by theinsulating film pattern and the protrusions of the element isolationfilm, on the semiconductor substrate of the floating gate region and thegate region; (c) forming a sacrificial insulating film where a word lineregion and the gate region are defined, on the entire surface includingthe first polysilicon layer; (d) forming a dielectric film on the cellregion including the sacrificial insulating film; (e) sequentiallyforming a second polysilicon layer and a metal layer on the entiresurface including the sacrificial insulating film; (f) allowing thedielectric film, the second polysilicon layer and the metal layer toremain only in a space between the sacrificial insulating films; (g)removing the sacrificial insulating films and the insulating filmpattern; and (h) forming source/drain on the semiconductor substrate atthe edge of the first polysilicon layer.
 19. The method as claimed inclaim 18, wherein part (a) of forming the element isolation film and theinsulating film pattern comprises: (a-1) forming a pad oxide film and apad nitride film on the semiconductor substrate; (a-2) etching the padnitride film and the pad oxide film of the element isolation region;(a-3) forming trenches in the semiconductor substrate of the elementisolation region; (a-4) removing the pad nitride film in the floatinggate region of the cell region and the gate region of the peripheralregion; (a-5) burying a space between the pad nitride films and thetrenches with an insulating material, thus forming the element isolationfilm and the insulating film pattern; and (a-6) removing the pad nitridefilm and the pad oxide film to expose the floating gate region and thegate region.
 20. The method as claimed in claim 18, wherein the gateinsulating films have a different thickness in the cell region and theperipheral circuit region.
 21. The method as claimed in claim 19,further comprising, after the trenches are formed, performing anoxidization process in order to mitigate etch damage generated on thesidewalls and at the bottom of the trenches.
 22. The method as claimedin claim 19, further comprising, after the pad nitride film and the padoxide film are removed, etching the projected portion of the elementisolation film and the insulating film pattern in order to widen theregion where the floating gate will be formed.
 23. The method as claimedin claim 22, wherein the projected portion of the element isolation filmand the insulating film pattern are etched by a wet etch process. 24.The method as claimed in claim 18, further comprising, before thesacrificial insulating film is formed, forming an etch-stop film on theentire surface including the first polysilicon layer, wherein theetch-stop film is etched in the same pattern as the sacrificialinsulating film.
 25. The method as claimed in claim 18, furthercomprising, before the dielectric film is formed, etching the firstpolysilicon layer of the cell region by an etch process using thesacrificial insulating film as an etch mask, thus forming the firstpolysilicon layer of the cell region in a cylindrical structure.
 26. Themethod as claimed in claim 18, wherein the metal layer is formed usingtungsten.
 27. The method as claimed in claim 18, further comprising,forming a barrier metal layer on the entire surface including the secondpolysilicon layer, before the metal layer is formed.
 28. The method asclaimed in claim 27, wherein the barrier metal layer is formed using WNor TiSiN.
 29. The method as claimed in claim 28, wherein the barriermetal layer is TiSiN and a content of Nitrogen in the TiSiN ranges from25% to 35%.
 30. The method as claimed in claim 28, wherein the barriermetal layer and the metal layer are consecutively formed in the samechamber.